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APX300-DM Plasma Dicer

NM-EFE3AA/NM-EFE3AA-D

Product details

Plasma dicing is becoming increasingly attractive in the semiconductor market. Dies are becoming smaller and thinner and manufacturers are facing difficulties such as increasing material loss due to the width of the dicing line, mechanical damage to the dies from chipping and increasingly longer processing times due to line-by-line mechanical dicing.

Panasonic’s APX300-DM Plasma Dicer solves these challenges and simultaneously provides a higher quality product with a lower cost of production. Ideal for thin, brittle, and ultra-thin wafers; a damage-free, particle-free, stress-free and high die strength non-contact dicing and enabling ultra-narrow 20μm dicing street. Up to 300mm wafer and patented tape and frame protection from effects of plasma during dicing.

Key features

  • Single chamber to scalable Cluster chamber option
  • Particle-free and damage-free process
  • Higher chip strength and yield improvements
  • The Panasonic APX300 is CE certified

Specification Description
Model ID APX300
Model No. NM-EFE3AA
Plasma Source ICP Plasma
Process Gas 4 Lines (standard) (Maximum 6 Lines: Chlorinated Gas, Fluoride Gas, Ar, O2, He, etc.)
Wafer Size * φ100 mm wafer with orientation flat (standard)
[*1]
Dimensions (mm) W 1,350 × D 2,230 × H 2,000 (Does not include touch panels, operation section and signal tower)
Mass 2,100 kg (differs depending on machine configuration)
Power Source * 3-phase AC 200 / 208 / 220 / 230 / 240 ±10 V, 50 / 60 Hz, 21.00 kVA
[*2]
Pneumatic Source 0.5 MPa to 0.7 MPa, 250 L/min (A.N.R.)
N2 Source 0.1 MPa to 0.2 MPa, 50 L/min (A.N.R.)
Model ID APX300
Model No. NM-EFE3AA-D
Plasma Source ICP Plasma
Wafer Size φ100mm / 150mm wafer with orientation flat φ200mm wafer with notch
Dimensions (mm) [Load lock wafer Handling] W 1,350 x D 2,230 x H 2,000 (Exclude touch panel, operation section and signal tower)
[Load lock wafer Handling] W 1,375 x D 2,600 x H 2,000 (Exclude touch panel, operation section and signal tower)
Mass 2,000 kg (Differs depending on machine configuration)
Power Source 3-phase AC 200 / 208 / 220 / 230 / 240 ±10 V, 50 / 60Hz, 21.00kVA
Pneumatic Source 0.5MPa to 0.7MPa, 250L/min (A.N.R.)
N2 Source 0.1MPa to 0.2MPa, 50L/min (A.N.R.)
[*1]: For other size wafers, please contact us
[*2]: 2 line 3-phase power source, and this shows the total